Electrode dependence and film resistivity effect in the electric-field-induced resistance-switching phenomena in epitaxial NiO films

Materials Science and Engineering: B

Volumn 148, Issue 1-3, 2008, Pages 40-42

  Ishihara, T ^a   Ohkubo, I ^a   Tsubouchi, K ^a   Kumigashira, H ^a,d   Joshi, U S ^b   Matsumoto, Y ^c   Koinuma, H ^a,d   Oshima, M ^a,d  

^a UNIVERSITY OF TOKYO   (Japan)

^b GUJARAT UNIVERSITY   (India)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^d JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Electrical measurements; Epitaxy thin films; Metal insulator metal structure; Nickel oxide

Indexed keywords

ALUMINUM COMPOUNDS; CARRIER CONCENTRATION; GRAIN BOUNDARIES; NICKEL OXIDE; PULSED LASER DEPOSITION;

ELECTRICAL MEASUREMENTS; ELECTRODE DEPENDENCE; ELECTRODE INTERFACES; EPITAXY THIN FILMS; FILM RESISTIVITY; METAL INSULATOR METAL STRUCTURE;

EPITAXIAL FILMS;

EID: 38949117537     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2007.09.073     Document Type: Article

References (11)

1. Sawa A., Fujii T., Kawasaki M., and Tokura Y. Appl. Phys. Lett. 85 (2004) 4073
2. Tsubouchi K., Ohkubo I., Kumigashira H., Oshima M., Matsumoto Y., Itaka K., Ohnishi T., Lippmaa M., and Koinuma H. Adv. Mater. 19 (2007) 1711
3. Kim C.J., Kim B.I., and Chen I.-W. Jpn. J. Appl. Phys. 44 (2005) 1260
4. Odagawa A., Kanno T., and Adachi H. J. Appl. Phys. 99 (2006) 016101
5. Watanabe Y., Bedonorz J.G., Bietsch A., Gerber Ch., Widmer D., Beck A., and Wind S.J. Appl. Phys. Lett. 78 (2001) 3738
6. I.G. Baek, M.S. Lee, S.O. Park, H.S. Kim, U.-I. Chung, S. Seo, M.J. Lee, D.H. Seo, D.-S. Suh, J.C. Park, I.K. Yoo, J.T. Moon, 2004 IEDM Technical Digest, 2004, pp. 587-590.
7. Seo S., Lee M.J., Seo D.H., Jeoung E.J., Suh D.-S., Joung Y.S., Yoo I.K., Hwang I.R., Kim S.H., Byun I.S., Kim J.-S., Choi J.S., and Park B.H. Appl. Phys. Lett. 85 (2004) 5655
8. Joshi U.S., Takahashi R., Matsumoto Y., and Koinuma H. Thin Solid Films 486 (2005) 214
9. Sawatzky G.A., and Allen J.W. Phys. Rev. Lett. 53 (1984) 2339
10. Moravec V.D., and Jarrold C.C. J. Chem. Phys. 108 (1998) 1804
11. Michaelson H.B. J. Appl. Phys. 48 (1977) 4729