Stress development in sputtered NiO thin films during heat treatment

Journal of Applied Physics

Volumn 94, Issue 8, 2003, Pages 4853-4858

  Bruckner W ^a   Kaltofen, R ^a   Thomas, J ^a   Hecker, M ^a   Uhlemann, M ^a   Oswald, S ^a   Elefant, D ^a   Schneider, C M ^a  

^a IFW DRESDEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPRESSIVE STRESS; MAGNETRON SPUTTERING; NICKEL COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

ELECTRON PROBE MICROANALYSIS;

THIN FILMS;

EID: 10744232340     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1609052     Document Type: Article

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