Terminal alkynes as an ink or background SAM in replacement lithography: Adventitious versus directed replacement

Langmuir

Volumn 26, Issue 18, 2010, Pages 15027-15034

  Tucker, Eric Z ^a   Gorman, Christopher B ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEST FIT; CHEMICAL EXCHANGE; FERROCENES; LIMITING FACTORS; LITHOGRAPHIC PATTERNING; N-ALKANETHIOLS; RATE MODELS; SCANNING TUNNELING MICROSCOPY (STM); TERMINAL ALKYNE; TIP-INDUCED;

ACETYLENE; DESORPTION; IRON COMPOUNDS; RATE CONSTANTS; SCANNING TUNNELING MICROSCOPY;

SELF ASSEMBLED MONOLAYERS;

EID: 77956580778     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la101676h     Document Type: Article

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