Scanning tunneling microscope-based replacement lithography on self-assembled monolayers. Investigation of the relationship between monolayer structure and replacement bias

Journal of Physical Chemistry B

Volumn 108, Issue 25, 2004, Pages 8581-8583

  Lewis, Matthew S ^a   Gorman, Christopher B ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHAIN LENGTH; MONOLAYER STRUCTURES; NONCOVELENT BINDING;

BINDING ENERGY; DESORPTION; GRADIENT INDEX OPTICS; LITHOGRAPHY; PRESSURE EFFECTS; SCANNING TUNNELING MICROSCOPY; STRUCTURAL ANALYSIS;

MONOLAYERS;

EID: 3142730658     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp0379244     Document Type: Article

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