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Volumn 18, Issue 6, 2010, Pages 5785-5790

Oxidized Silicon-On-Insulator (OxSOI) from bulk silicon: A new photonic platform

Author keywords

[No Author keywords available]

Indexed keywords

MICROSENSORS; SILICON OXIDES;

EID: 77949577244     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.005785     Document Type: Article
Times cited : (40)

References (12)
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    • 0001636831 scopus 로고    scopus 로고
    • Buried Layer Engineering to Reduce the Drain-Induced Barrier Lowering of Sub-0.05 μm. SOIMOSFET
    • B
    • R. Koh, "Buried Layer Engineering to Reduce the Drain-Induced Barrier Lowering of Sub-0.05 μm. SOIMOSFET," Jpn. J. Appl. Phys. 38(Part 1, No. 4B), 2294-2299 (1999).
    • (1999) Jpn. J. Appl. Phys. , vol.38 , Issue.4 PART 1 , pp. 2294-2299
    • Koh, R.1
  • 8
    • 61449242892 scopus 로고    scopus 로고
    • Low-loss silicon-on-insulator shallowridge TE and TM waveguides formed using thermal oxidation
    • R. Pafchek, R. Tummidi, J. Li, M. A. Webster, E. Chen, and T. L. Koch, "Low-loss silicon-on-insulator shallowridge TE and TM waveguides formed using thermal oxidation," Appl. Opt. 48(5), 958-963 (2009).
    • (2009) Appl. Opt. , vol.48 , Issue.5 , pp. 958-963
    • Pafchek, R.1    Tummidi, R.2    Li, J.3    Webster, M.A.4    Chen, E.5    Koch, T.L.6
  • 11
    • 0041742289 scopus 로고    scopus 로고
    • Nanotaper for compact mode conversion
    • V. R. Almeida, R. R. Panepucci, and M. Lipson, "Nanotaper for compact mode conversion," Opt. Lett. 28(15), 1302-1304 (2003).
    • (2003) Opt. Lett. , vol.28 , Issue.15 , pp. 1302-1304
    • Almeida, V.R.1    Panepucci, R.R.2    Lipson, M.3
  • 12
    • 0017983719 scopus 로고
    • Thermal Oxidation Rate of a Si3N4 Film and Its Masking Effect against Oxidation of Silicon
    • T. Enomoto, R. Ando, H. Morita, and H. Nakayama, "Thermal Oxidation Rate of a Si3N4 Film and Its Masking Effect against Oxidation of Silicon," Jpn. J. Appl. Phys. 17(6), 1049-1058 (1978).
    • (1978) Jpn. J. Appl. Phys. , vol.17 , Issue.6 , pp. 1049-1058
    • Enomoto, T.1    Ando, R.2    Morita, H.3    Nakayama, H.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.