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Volumn 17, Issue 3, 2010, Pages 353-358
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A study of the characteristics of organicinorganic hybrid plasma-polymer thin films by co-deposition of toluene and TEOS
a
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Author keywords
Low ; mechanical and electronic properties; PECVD
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Indexed keywords
AFM;
AS-GROWN;
CAPACITANCE VALUES;
CARRIER GAS;
CODEPOSITION;
DEPOSITION CONDITIONS;
DIELECTRIC CONSTANTS;
ELECTRICAL AND MECHANICAL PROPERTIES;
FOURIER TRANSFORM INFRARED;
HYBRID PLASMA;
HYBRID POLYMER THIN FILMS;
IMPEDANCE ANALYZER;
INORGANIC PRECURSOR;
MECHANICAL AND ELECTRONIC PROPERTIES;
MIXTURE RATIO;
NANOINDENTERS;
ORGANIC-INORGANIC HYBRID;
ORGANIC-INORGANIC HYBRID POLYMER;
PECVD;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PE CVD);
PLASMA POWER;
POLYMER THIN FILMS;
RADIO FREQUENCIES;
RF-POWER;
SILICON (100);
SMOOTH SURFACE;
TEOS (TETRAETHOXYSILANE);
WALL TEMPERATURES;
YOUNG'S MODULUS;
ARGON;
ATOMIC FORCE MICROSCOPY;
ATOMIC SPECTROSCOPY;
DEPOSITION;
ELECTRIC PROPERTIES;
ELECTRONIC PROPERTIES;
FOURIER TRANSFORMS;
MECHANICAL PROPERTIES;
PHOTOSENSITIVITY;
PLASMA DEPOSITION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
PLASMAS;
PLASTIC FILMS;
POLYMERIC FILMS;
POLYMERS;
SEMICONDUCTING SILICON COMPOUNDS;
THIN FILMS;
TOLUENE;
VAPOR DEPOSITION;
POLYMER FILMS;
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EID: 77956077978
PISSN: 0218625X
EISSN: None
Source Type: Journal
DOI: 10.1142/S0218625X10013989 Document Type: Article |
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Times cited : (6)
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References (20)
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