Growth of plasma-polymerized thin films by PECVD method and study on their surface and optical characteristics

Surface and Coatings Technology

Volumn 193, Issue 1-3 SPEC. ISS., 2005, Pages 142-146

  Bae, I S ^a   Cho, S H ^a   Lee, S B ^a   Kim, Y ^a   Boo, J H ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Methylcyclohexane; Organic polymerization; PECVD

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; GLASS; HYDROGEN; OPTICAL PROPERTIES; PLASMAS; POLYMERS; REFRACTIVE INDEX; SILICON; SUBSTRATES;

ETHYLCYCLOHEXANE; ORGANIC PRECURSORS; PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

THIN FILMS;

POLYMERIZATION;

EID: 13844296381     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.07.022     Document Type: Article

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