A simple analysis on the abnormal behavior of the argon metastable density in an inductively coupled Ar plasma

Thin Solid Films

Volumn 518, Issue 22, 2010, Pages 6694-6699

  Park, Min ^a   Chang, Hong Young ^a   You, Shin Jae ^b   Kim, Jung Hyung ^b   Seong, Dae Jin ^b   Shin, Yong Hyeon ^b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Korea Research Institute of Standards and Science   (South Korea)

Author keywords

EEDF; Global model; Hysteresis; ICP; Metastable; Mode; Multistep ionization; Plasma

Indexed keywords

EEDF; GLOBAL MODELS; ICP; METASTABLE; MODE; MULTI-STEP;

ARGON; CARRIER CONCENTRATION; DISTRIBUTION FUNCTIONS; ELECTROMAGNETIC INDUCTION; ELECTRON DENSITY MEASUREMENT; ELECTRON ENERGY ANALYZERS; ELECTRONS; HYSTERESIS; IONIZATION; PARTICLE DETECTORS; PLASMAS; QUALITY CONTROL;

ELECTRIC DISCHARGES;

EID: 77956056192     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.03.135     Document Type: Conference Paper

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