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Volumn 505, Issue 2, 2010, Pages 434-442

Study on chemical solution deposition of aluminum-doped zinc oxide films

(9) Li, Gang a Zhu, Xuebin a Lei, Hechang a Song, Wenhai a Yang, Zhaorong a Dai, Jianming a Sun, Yuping a Pan, Xu b Dai, Songyuan b

a INSTITUTE OF SOLID STATE PHYSICS (China)

b INSTITUTE OF PLASMA PHYSICS (China)

Author keywords

Annealing temperature; Sol gel; Transparent conductive oxide; ZnO:Al

Indexed keywords

AL CONTENT; ALUMINUM-DOPED ZINC OXIDE; ANNEALING TEMPERATURES; CHEMICAL SOLUTION DEPOSITION; CHEMICAL SOLUTION DEPOSITION METHOD; GLASS SLIDES; OPTICAL CHARACTERISTICS; PROCESSING PARAMETERS; REDUCING ATMOSPHERE; RESISTIVITY VALUES; SOLUTION CONCENTRATION; TRANSPARENT CONDUCTIVE OXIDES; ZNO; ZNO:AL THIN FILMS;

ALUMINUM; ALUMINUM COATINGS; ANNEALING; CHEMICALS; DEPOSITION; GELS; OXIDE FILMS; SOL-GEL PROCESS; SOL-GELS; SOLS; ZINC; ZINC OXIDE;

ATMOSPHERIC TEMPERATURE;

EID: 77955921325 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2010.06.083 Document Type: Article

Times cited : (17)

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