Microstructure dependence of ZnO:Al films on the deposition conditions and the surface morphology of silicon substrate

Journal of Crystal Growth

Volumn 289, Issue 2, 2006, Pages 464-471

  Jiang, X ^a   Jia, C L ^b   Hong, R J ^a  

^a UNIVERSITY OF SIEGEN   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

A3. Physical vapor deposition processes; B1. Oxides; B1. Zinc compounds

Indexed keywords

ALUMINUM; DEPOSITION; MICROSTRUCTURE; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PARTIAL PRESSURE; PHYSICAL VAPOR DEPOSITION; SILICON; SILICON WAFERS; TRANSMISSION ELECTRON MICROSCOPY; ZINC OXIDE;

SILICON SUBSTRATES; TRANSITION MODE;

THIN FILMS;

EID: 33644856116     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.12.067     Document Type: Article

References (26)

1. T. Yamamoto, T. Shiosaki, and A. Kawabata J. Appl. Phys. 51 1980 3113
2. C. Beneking, B. Rech, S. Wieder, O. Kluth, H. Wagner, W. Frammelsberger, R. Gever, P. Lechner, and H. Schade Thin Solid Films 351 1999 241
3. Y. Akao, and T. Haranoh H. Pulker H. Schmidt M.A. Aegerter Proceedings of the Second International Conference on Coatings on Glass (ICCG) 1999 Elsevier Science Amsterdam 338
4. I. Hamberg, and C.G. Granqvist J. Appl. Phys. 60 1986 R123
5. G. Granqvist Appl. Phys. A 57 1993 19
6. D.L. Raimondi, and E. Kay J. Vac. Sci. Technol. 7 1970 96
7. F.S. Hickernell J. Appl. Phys. 44 1973 1061
8. S. Jäger, B. Szyszka, J. Szczyrbowski, and G. Bräuer Surf. Coat. Technol. 98 1998 1304
9. K. Machida, M. Shibutani, Y. Murayama, and T.R. Matsumoto IECE 62 1979 358
10. J. Exarhos, and S.K. Sharma Thin Solid Films 270 1995 27
11. J.S. Zabinski, J. Corneille, S.V. Prasad, N.T. McDevitt, and J.B. Bultmann J. Mater. Sci. 32 1997 313
12. T. Shiosaki, S. Ohnishi, and A. Kawabata J. Appl. Phys. 50 1979 3113
13. C. Galli, and J.E. Cooker Appl. Phys. Lett. 16 1970 439
14. V. Srikant, V. Sergo, and D.R. Clarke J. Am. Ceram. Soc. 78 1995 1931
15. C.R. Gorla, N.W. Emanetoglu, S. Liang, W.E. Mayo, Y. Lu, M. Wraback, and H. Shen J. Appl. Phys. 85 1999 2595
16. Y. Yoshino, K. Inoue, M. Takeuchi, T. Makino, Y. Katayama, and T. Hata Vacuum 59 2000 403
17. L. Sagalowicz, G.R. Fox, M.A. Dubois, C.A.P. Muller, P. Muralt, and N. Setter J. Euro. Ceram. Soc. 19 1999 1427
18. I. Sieber, N. Wanderka, I. Urban, I. Dörfel, E. Schierhorn, F. Fenske, and W. Fuhs Thin Solid Films 330 1998 108
19. T. Minami, H. Sato, H. Nanto, and S. Takata Thin Solid Films 176 1989 277
20. O. Kluth, B. Rech, L. Houben, S. Wieder, G. Schope, C. Beneking, H. Wagner, A. Loffl, and H.W. Schock Thin Solid Films 351 1999 247
21. J.C. Kim, and E. Goo J. Am. Ceram. Soc. 73 1990 877
22. M.A. McCoy, R.W. Grimes, and W.E. Lee J. Mater. Res. 11 1996 2009
23. L. Sagalowicz, and G.R. Fox J. Mater. Res. 14 1998 1876
24. N. Malkomes, M. Vergöhl, and B. Szyszka J. Vac. Sci. Technol. A 19 2001 414
25. R. Kern, G. Le Lay, J.J. Metois, in: E. Kaldis (Ed.), Current Topics in Material Science, Amsterdam, 1979. p. 138.
26. N. Fujimura, T. Nishihara, S. Goto, J. Xu, and T. Ito J. Crystal Growth 130 1993 269