Thickness dependence of structural, electrical and optical behaviour of undoped ZnO thin films

Physica B: Condensed Matter

Volumn 403, Issue 18, 2008, Pages 3326-3330

  Bouderbala, M ^a   Hamzaoui, S ^a   Amrani, B ^b   Reshak, Ali H ^c   Adnane, M ^a   Sahraoui, T ^a   Zerdali, M ^a  

^a UNIVERSITÉ DES SCIENCES ET DE LA TECHNOLOGIE D ORAN MOHAMED BOUDIAF   (Algeria)

^b UNIVERSITÉ DE MASCARA   (Algeria)

^c UNIVERSITY OF SOUTH BOHEMIA   (Czech Republic)

Author keywords

Hall effect; Structural and optical properties; Thickness effect; ZnO

Indexed keywords

ELECTRIC PROPERTIES; FILM GROWTH; GRAIN (AGRICULTURAL PRODUCT); GRAIN SIZE AND SHAPE; METALLIC FILMS; OPTICAL FILMS; OPTICAL PROPERTIES; SEMICONDUCTING CADMIUM TELLURIDE; SEMICONDUCTING ZINC COMPOUNDS; THICK FILMS; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZINC ALLOYS; ZINC OXIDE;

ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL PROPERTIES; FILM-THICKNESS; GRAIN SIZES; HALL EFFECT; OPTICAL BEHAVIOUR; R.F. SPUTTERING; STRUCTURAL AND OPTICAL PROPERTIES; SUBSTRATE SURFACES; THICKNESS DEPENDENCES; THICKNESS EFFECT; THICKNESS EFFECTS; X-RAY DIFFRACTION; ZNO; ZNO THIN FILMS;

MOLECULAR BEAM EPITAXY;

EID: 48949095676     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2008.04.045     Document Type: Article

References (21)

1. Ryu Y.R., Zhu S., Look D.C., Wrobel J.M., Jeong H.M., and White H.W. J. Crystal Growth 216 1-4 (2000) 330
2. Wang C., Ji Z., Xi J., Du J., and Ye Z. Mater. Lett. 60 7 (2006) 912
3. Guo X.L., Tabata H., and Kawai T. J. Crystal Growth 1 237-239 (2002) 544
4. Purica M., Budianu E., Rusu E., Danila et M., and Gavrila R. Thin Solid Films 403-404 (2002) 485-488
5. Fay S., Kroll U., Bucher C., Vallat-Sauvain E., and Shah A. Sol. Energy Mater. Sol. Cells 86 3 (2005) 385
6. Kim Y.J., and Kim H.J. Mater. Lett. 21 3-4 (1994) 351
7. Major S., Banerjee A., and Chopra K.L. Thin Solid Films 122 (1984) 31
8. Eberspacher C., Fahrenbruch A.L., and Bube R.H. Thin Solid Films 136 (1986) 1
9. Studenikin A., Golego N., and Cocivera M. J. Appl. Phys. 83 4 (1998) 2104
10. Minami T., Nanto H., and Takata S. Thin Solid Films 109 (1983) 379
11. Bang K.H., Hwang D.K., and Myoung J.M. Appl. Surf. Sci. 207 (2003) 359
12. Hayashia Y., Kondoa K., Muraia K., Morigaa T., Nakabayashia I., Fukumotob H., and Tominaga K. Vacuum 74 (2004) 607
13. Tsujino J., Homma N., Sugawara T., Shimono I., and Abe Y. Thin Solid Films 407 1-2 (2002) 86
14. Scarisoreanu N., Matei D.G., Dinescu G., Epurescu G., Ghica C., Nisto L.C., and Dinescu M. Appl. Surf. Sci. 247 (2005) 518
15. Jain A., Sagar P., and Mehra R.M. Solid State Electron. 50 7-8 (2006) 1420
16. Chopra K.L., Major S., and Pandya D.K. Thin Solid Films 102 (1983) 1
17. Bouderbala M., Hamzaoui S., Stambouli A.B., and Bouziane H. Appl. Energy 64 (1999) 89
18. Shim E.S., Kang H.S., Kang J.S., Kim J.H., and Lee S.Y. Appl. Surf. Sci. 186 (2002) 474
19. Ebothé J., Miedzinski R., Kapustianyk V., Turko B., Kulyk B., Gruhn W., and Kityk I.V. J. Phys.: Conf. Ser. 79 (2007) 012001
20. Ozga K., Kawaharamura T., Ali Umar A., Oyama M., Nouneh K., Slezak A., Fujita S., Piasecki M., Ali Reshak H., and Kityk I.V. Nanotechnology 19 (2008) 185709
21. Ebothe J., Kityk I.V., Benet S., Claudet B., Plucinski K.J., and Ozga K. Opt. Commun. 268 (2006) 269-272