Silicon oxide diffusion barrier coatings on polypropylene

Thin Solid Films

Volumn 518, Issue 17, 2010, Pages 4840-4846

  Korner L ^a   Sonnenfeld, A ^a   Von Rohr, Ph Rudolf ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

Diffusion barriers; Fourier transform infrared spectroscopy; Oxygen transmission rate; Plasma enhanced chemical vapor deposition; Polypropylene; Silicon oxide

Indexed keywords

AMORPHOUS GLASS; APPARENT ACTIVATION ENERGY; BARRIER PERFORMANCE; COATING THICKNESS; CRITICAL THICKNESS; DIFFUSION BARRIER COATINGS; ENERGY INPUTS; LIMITING FACTORS; LOW CARBON; LOW OXYGEN; MONOMER RATIO; OXYGEN PERMEATION; OXYGEN TRANSMISSION RATE; PLASMA CONDITIONS; PROCESS CONDITION; RATE THEORY; RF-POWER; SILANOLS; SUBSTRATE MATERIAL; TYPICAL VALUES;

ACTIVATION ENERGY; COPOLYMERIZATION; DEFECT DENSITY; DEFECTS; DIFFUSION BARRIERS; DIFFUSION COATINGS; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MONOMERS; OXYGEN; OXYGEN PERMEABLE MEMBRANES; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA THEORY; POLYETHYLENE TEREPHTHALATES; POLYPROPYLENE OXIDES; SILICON COMPOUNDS; SILICON OXIDES; SUBSTRATES; THERMAL LOAD; THERMOANALYSIS; THERMOPLASTICS; THICKNESS MEASUREMENT; VAPOR DEPOSITION;

FOURIER TRANSFORMS;

EID: 77955655541     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.02.006     Document Type: Article

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