Low-loss optical waveguides for the near ultra-violet and visible spectral regions with Al2O3 thin films from atomic layer deposition

Thin Solid Films

Volumn 518, Issue 17, 2010, Pages 4935-4940

  Aslan, Mustafa M ^a,b   Webster, Nathan A ^a   Byard, Courtney L ^a   Pereira, Marcelo B ^a   Hayes, Colin M ^a,c   Wiederkehr, Rodrigo S ^a   Mendes, Sergio B ^a,b  

^a UNIVERSITY OF LOUISVILLE   (United States)

^b MATERIALS INSTITUTE   (Turkey)

^c FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

Author keywords

Alumina film; Aluminum oxide; Atomic layer deposition; Optical constants; Optical waveguide; Propagation loss; Refractive index; Ultra violet

Indexed keywords

ALUMINA FILMS; ALUMINUM OXIDE; ATOMIC LAYER; PROPAGATION LOSS; ULTRA-VIOLET;

ALUMINUM; ATOMIC LAYER DEPOSITION; ATOMS; DEPOSITION; FILMS; FUSED SILICA; LIGHT REFRACTION; OPTICAL CONSTANTS; OPTICAL WAVEGUIDES; OXIDES; REFRACTIVE INDEX; REFRACTOMETERS; SILICA; WAVEGUIDES;

ALUMINUM COATINGS;

EID: 77955654333     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.03.011     Document Type: Article

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