SCOPUS 정보 검색 플랫폼

Volumn 6, Issue 16, 2010, Pages 1812-1821

High-throughput near-field optical nanoprocessing of solution-deposited nanoparticles

(7) Pan, Heng a Hwang, David J a Ko, Seung H a Clem, Tabitha A b Fréchet, Jean M J b Bäuerle, Dieter c Grigoropoulos, Costas P a

a UNIVERSITY OF CALIFORNIA (United States)

b UNIVERSITY OF CALIFORNIA (United States)

c JOHANNES KEPLER UNIVERSITY LINZ (Austria)

Author keywords

Lasers; Nanoparticles; Organic field effect transistors; Patterning; Processing

Indexed keywords

BUILDING BLOCKES; ELECTRICAL CONDUCTIVITY; FURNACE ANNEALING; HIGH-THROUGHPUT; LASER-ASSISTED; LOW PROCESSING TEMPERATURE; MINIMUM FEATURE SIZES; NANO SCALE; NANO-MANUFACTURING; NANO-MANUFACTURING TECHNOLOGY; NANO-MATERIALS; NANODOTS; NANOLINES; NANOPARTICLE FILMS; NANOPROCESSING; NEAR-FIELD; OPTICAL CONFINEMENT STRUCTURE; OPTICAL NEAR FIELD; PATTERNING; SUBMICROMETERS;

ELECTRIC CONDUCTIVITY; NANOPARTICLES; NANOSTRUCTURED MATERIALS; ORGANIC FIELD EFFECT TRANSISTORS; ORGANIC LASERS; OXYGEN; PROCESSING; SINTERING;

FIELD EFFECT TRANSISTORS;

NANOPARTICLE;

ARTICLE; CHEMISTRY; ELECTRIC CONDUCTIVITY; EQUIPMENT DESIGN; METHODOLOGY; NANOTECHNOLOGY; SOLUTION AND SOLUBILITY;

ELECTRIC CONDUCTIVITY; EQUIPMENT DESIGN; NANOPARTICLES; NANOTECHNOLOGY; SOLUTIONS;

EID: 77955636782 PISSN: 16136810 EISSN: 16136829 Source Type: Journal
DOI: 10.1002/smll.201000345 Document Type: Article

Times cited : (62)

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