Selective molecular assembly patterning at the nanoscale: A novel platform for producing protein patterns by electron-beam lithography on SiO 2/indium tin oxide-coated glass substrates

Nanotechnology

Volumn 16, Issue 9, 2005, Pages 1781-1786

  Lussi, Jost W ^a   Tang, Clarence ^a,b   Kuenzi, Pierre Andre ^c   Staufer, Urs ^c   Csucs, Gabor ^a   Vörös, Janos ^a   Danuser, Gaudenz ^a,d   Hubbell, Jeffrey A ^a,e   Textor, Marcus ^a  

^a ETH ZURICH   (Switzerland)

^b SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^c UNIVERSITY OF NEUCHÂTEL   (Switzerland)

^d SCRIPPS RESEARCH INSTITUTE   (United States)

^e EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; GLASS; MOLECULAR ORIENTATION; NANOSTRUCTURED MATERIALS; PROTEINS; SILICA; SUBSTRATES; SURFACE TREATMENT;

CELL ADHESION; GLASS SUBSTRATES; SELECTIVE MOLECULAR ASSEMBLY PATTERNING (SMAP); SUBMICRON STRUCTURES;

SELF ASSEMBLY;

EID: 23444431581     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/9/062     Document Type: Review

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