Laser-induced etching and deposition of W using a-SiO2 microspheres

Applied Physics A: Materials Science and Processing

Volumn 76, Issue 4, 2003, Pages 549-550

  Denk, R ^a   Piglmayer, K ^a   Bauerle D ^a  

^a JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; CONTINUOUS WAVE LASERS; CRYSTAL LATTICES; DEPOSITION; ETCHING; LASER APPLICATIONS; LASER BEAMS; QUARTZ APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; TUNGSTEN;

FULL WIDTH AT HALF MAXIMUM; FUSED QUARTZ SUPPORT; LASER INDUCED ETCHING; MICROLENS ARRAY; SILICA MICROSPHERES;

SILICA;

EID: 0037357192     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-002-1892-8     Document Type: Article

References (8)

1. D. Bäuerle: Laser Processing and Chemistry, 3rd edn. (Springer, Berlin, 2000)
2. R. Denk, K. Piglmayer, D. Bäuerle: Appl. Phys. A 74, 825 (2002)
3. R. Denk, K. Piglmayer, D. Bäuerle: Appl. Phys. A 75 (2002)
4. K. Piglmayer, R. Denk, D. Bäuerle: Appl. Phys. Lett. 80, 4693 (2002)
5. D. Bäuerle, K. Piglmayer, R. Denk, N. Arnold: Lambda Highlights 60, 1 (2002)
6. R.S. Blewer, E.K. Broadbent, V.A. Walls, C.M. McConica (Eds.): Tungsten and Other Refractory Metals for VLSI Applications (Mat. Res. Soc., Pittsburgh 1985-1988)
7. G. Dittmer, A. Klopfer, J. Schröder: Philips Res. Repts. 32, 341 (1977)
8. G. Dittmer, U. Niemann: Philips J. Res. 36, 89 (1981)