Electrical characterisation of HfYO MIM-structures deposited by ALD

Thin Solid Films

Volumn 518, Issue 16, 2010, Pages 4680-4683

  Roessler, T ^a   Gluch, J ^b   Albert, M ^a   Bartha, J W ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b IFW DRESDEN   (Germany)

Author keywords

ALD; Doping; HfO2; High k; MIM; Y2O3; Yttrium

Indexed keywords

ALD; DOPING; HFO2; HIGH K; MIM; Y2O3;

AMORPHOUS FILMS; DOPING (ADDITIVES); HAFNIUM COMPOUNDS; THICK FILMS; TITANIUM NITRIDE; YTTRIUM;

YTTRIUM ALLOYS;

EID: 77955635444     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.12.058     Document Type: Conference Paper

References (10)

1. D. Fischer, and A. Kersch Appl. Phys. Lett. 92 2008 012908
2. X. Zhao, and D. Vanderbilt Phys. Rev. B 65 2002 233106
3. T.S. Böscke, S. Govindarajan, P.D. Kirsch, P.Y. Hung, C. Krug, B.H. Lee, J. Heitmann, U. Schröder, G. Pant, and B.E. Gnade Appl. Phys. Lett. 91 2007 072902
4. P.K. Park, and S.-W. Kang Appl. Phys. Lett. 89 2006 192905
5. S. Govindarajan, T.S. Böscke, P. Sivasubramani, P.D. Kirsch, B.H. Lee, H.-H. Tseng, R. Jammy, U. Schröder, S. Ramanathan, and B.E. Gnade Appl. Phys. Lett. 91 2007 062906
6. C. Adelmann, V. Sriramkumar, S. Van Elshocht, P. Lehnen, T. Conard, and S. De Gendt Appl. Phys. Lett. 91 2007 162902
7. K. Kita, K. Kyuno, and A. Toriumi Appl. Phys. Lett. 86 2005 102906
8. Y. Widjaja, and C.B. Musgrave J. Chem. Phys. 117 5 2002 1931
9. H.B. Park, M. Cho, J. Park, S.W. Lee, C.S. Hwang, J.-P. Kim, J.-H. Lee, N.-In Lee, Ho-Kyu Kang, J.-C. Lee, and S.-J. Oh J. Appl. Phys. 94 5 2003
10. J. Niinistö, M. Putkonen, and L. Niinistö Chem. Mater 16 2004 2953