The role of self-shadowing on growth and scaling laws of faceted polycrystalline thin films

Acta Materialia

Volumn 58, Issue 15, 2010, Pages 5150-5159

  Ophus, Colin ^a,b   Ewalds, Timo ^a,b   Luber, Erik J ^a,b   Mitlin, David ^a,b  

^a UNIVERSITY OF ALBERTA   (Canada)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

Computer simulations; Grain morphology; Thin film growth; Vapor deposition

Indexed keywords

ALUMINUM THIN FILMS; ANOMALOUS BEHAVIOR; ANOMALOUS SCALING; BALLISTIC DEPOSITION MODEL; DEPOSITION FLUXES; FILM SURFACE MORPHOLOGY; GRAIN MORPHOLOGIES; GRAIN MORPHOLOGY; LEVEL SET; POLYCRYSTALLINE THIN FILM;

ANGULAR DISTRIBUTION; COMPUTATIONAL METHODS; COMPUTER SIMULATION; DEPOSITION; DISTRIBUTION FUNCTIONS; GRAIN GROWTH; MORPHOLOGY; THIN FILMS; VAPOR DEPOSITION;

FILM GROWTH;

EID: 77955420440     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2010.05.051     Document Type: Article

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