Simulations of faceted polycrystalline thin films: Asymptotic analysis

Acta Materialia

Volumn 57, Issue 5, 2009, Pages 1327-1336

  Ophus, Colin ^a,b   Luber, Erik ^a,b   Mitlin, David ^a,b  

^a UNIVERSITY OF ALBERTA   (Canada)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

Chemical vapor deposition; Computer simulation; Grain morphology; Thin film growth

Indexed keywords

ASYMPTOTIC ANALYSIS; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; GRAIN GROWTH; GROWTH (MATERIALS); MOLECULAR BEAM EPITAXY; PHOTORESISTS; SOLIDS; SURFACE ROUGHNESS; THIN FILM DEVICES; THIN FILMS; VAPORS;

COLUMNAR MICROSTRUCTURES; CRYSTAL GEOMETRIES; DRIFT MODELS; GRAIN DIAMETERS; GRAIN MORPHOLOGY; LEVEL SETS; POLYCRYSTALLINE THIN FILMS; SELF-SIMILAR; STATISTICAL MEASURES; SURFACE TEXTURES; THIN FILM GROWTH; TIME STEPS;

FILM GROWTH;

EID: 60249086140     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2008.11.014     Document Type: Article

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