The influence of nanoscale morphology on the resistivity of cluster-assembled nanostructured metallic thin films

New Journal of Physics

Volumn 12, Issue , 2010, Pages

  Barborini, J E ^a   Corbelli, G ^b   Bertolini, G ^a   Repetto, P ^a   Leccardi, M ^a   Vinati, S ^a   Milani, P ^b  

^a Via Franco Russoli 3   (Italy)

^b UNIVERSITY OF MILAN   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CLUSTER INTERCONNECTION; ELECTRICAL RESISTIVITY; IN-SITU; METALLIC THIN FILMS; MORPHOLOGICAL FEATURES; NANO SCALE; NANO-STRUCTURED; NANOSCALE MORPHOLOGY; ORDERS OF MAGNITUDE; SUPERSONIC CLUSTER BEAM DEPOSITION;

CHEMICAL MODIFICATION; ELECTRIC CONDUCTIVITY; PALLADIUM; SURFACE ROUGHNESS;

NANOSTRUCTURED MATERIALS;

EID: 77955329956     PISSN: 13672630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1367-2630/12/7/073001     Document Type: Article

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