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Volumn 12, Issue 10, 2010, Pages 2380-2391

222 nm Photo-induced radical reactions in silazanes. A combined laser photolysis, EPR, GC-MS and QC Study

Author keywords

[No Author keywords available]

Indexed keywords

FREE RADICAL; SILICONE DERIVATIVE;

EID: 77955301322     PISSN: 14639076     EISSN: None     Source Type: Journal    
DOI: 10.1039/b918814b     Document Type: Article
Times cited : (13)

References (46)
  • 20
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    • Eur. Pat. EP0745974B1
    • Eur. Pat. EP0745974B1, 1996
    • (1996)
  • 21
    • 77955962704 scopus 로고    scopus 로고
    • Jap. Pat. JP11092666AA
    • Jap. Pat. JP11092666AA, 1999
    • (1999)
  • 22
    • 77955930653 scopus 로고    scopus 로고
    • Jap. Pat. JP10279362AA
    • Jap. Pat. JP10279362AA, 1998
    • (1998)
  • 36
    • 77955947355 scopus 로고    scopus 로고
    • NIST Standard Reference Database 1A (Data Version: NIST 02), National Institute of Standards and Technology, Gaithersburg, MD, 2002
    • NIST Standard Reference Database 1A (Data Version: NIST 02), National Institute of Standards and Technology, Gaithersburg, MD, 2002


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.