Novel EUV mask inspection tool with 199-nm laser source and high-resolution optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7488, Issue , 2009, Pages

  Kikuiri, Nobutaka ^a   Hirono, Masatoshi ^a   Hirano, Ryoichi ^a   Amano, Tsuyoshi ^b   Suga, Osamu ^b   Shigemura, Hiroyuki ^b   Hashimoto, Hideaki ^c   Takahara, Kenichi ^c   Usuda, Kinya ^c  

^a Advanced Mask Inspection Technology Inc   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^c NUFLARE TECHNOLOGY INC   (Japan)

Author keywords

DUV; EUV; EUV mask; Inspection optics; Mask inspection; Pattern defect; Polarization

Indexed keywords

DUV; EUV; EUV MASK; MASK INSPECTION; PATTERN DEFECTS;

ALIGNMENT; INSPECTION EQUIPMENT; OPTICS; PHOTOMASKS;

INSPECTION;

EID: 77954399367     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.829747     Document Type: Conference Paper

References (10)

1. R. Hirano, et al., "Development of Advanced mask inspection optics with transmitted and reflected light image acquisition", Proc. SPIE 6518, (2007).
2. Dong-Hoon Chung, et al., "Optical inspection strategy for 65nm and beyond", Digest of Papers Photomask Japan, (2004).
3. T. Tojo, et al., "Advanced mask inspection optical system (AMOS) using 198.5nm wavelength for 65 nm node (hp) and beyond: system development and initial state D/D inspection performance", Proc. SPIE 5567, (2004).
4. F.A. Driessen, et al, "Flexible sensitivity inspection with TK-CMI software for Criticality-Awareness", Proc. SPIE 7122, (2008).
5. M. Shiratsuchi, et al., "Development of a captured image simulator for the Differential Interference Contrast Microscope aiming to design 199 nm mask inspection tools", Proc. SPIE 6730, (2007).
6. R. Hirano, et al., "Study of mask defect inspection optics for hp 45-nm node device and beyond", Digest of Papers Photomask Technolog, (2007).
7. N. Kikuiri, et al., "Development of Advanced Reticle Inspection Apparatus for hp 65 nm node device and beyond", Proc. SPIE 6283, (2006).
8. Y. Tsuji, et al., "Development of next generation mask inspection method by using the feature of mask image captured with 199nm inspection optics", Proc. SPIE 6349, (2006).
9. R. Ogawa, et al., "Characteristic of an autofocus system on a grating with period smaller than the focus beam wavelength", Proc. SPIE5256, (2003).
10. H. Shigemura, et al., "Evaluation of EUVL mask defect inspection using 199-nm inspection tool with super-resolution method", Proc. SPIE7379, (2009).