Development of a captured image simulator for the differential interference contrast microscopes aiming to design 199 nm mask inspection tools

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Shiratsuchi, Masataka ^a   Honguh, Yoshinori ^a   Hirano, Ryoichi ^b   Ogawa, Riki ^b   Hirono, Masatoshi ^b   Nomura, Takehiko ^c  

^a TOSHIBA CORPORATION   (Japan)

^b Advanced Mask Inspection Technology Inc   (Japan)

^c NUFLARE TECHNOLOGY INC   (Japan)

Author keywords

Birefringent; Captured image profile simulation; Differential interference contrast microscope; Mask inspection; Phase shifting mask; Rigorous coupled wave analysis; Wollaston prism

Indexed keywords

BIREFRINGENCE; COMPUTATION THEORY; OPTICAL RESOLVING POWER; SIGNAL INTERFERENCE;

CAPTURED IMAGE PROFILE SIMULATION; DIFFERENTIAL INTERFERENCE CONTRAST MICROSCOPE; MASK INSPECTION; PHASE SHIFTING MASK; RIGOROUS COUPLED WAVE ANALYSIS; WOLLASTON PRISM;

IMAGE ANALYSIS;

EID: 42149190209     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.747909     Document Type: Conference Paper

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