Flexible sensitivity inspection with TK-CMI software for Criticality-awareness

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Driessen, Frank A J M ^a   Gunawardena, Jamila ^a   Saito, Yasuko ^b   Tsuchiya, Hideo ^b   Tsuji, Yoshitake ^c  

^a Takumi Technology Corporation   (United States)

^b NUFLARE TECHNOLOGY INC   (Japan)

^c Advanced Mask Inspection Technology Inc   (Japan)

Author keywords

Criticality awareness; DFM; Flexible mask inspection; Flexible mask specification; GDS; OASIS; Pscuclo defect; Reticle manufacturing

Indexed keywords

CRITICALITY AWARENESS; DFM; FLEXIBLE MASK INSPECTION; FLEXIBLE MASK SPECIFICATION; GDS; OASIS; PSCUCLO DEFECT; RETICLE MANUFACTURING;

DEFECTS; INSPECTION; INSPECTION EQUIPMENT; OPTICAL INSTRUMENTS; SPECIFICATIONS; SUBMARINE GEOPHYSICS;

CRITICALITY (NUCLEAR FISSION);

EID: 62649138106     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.803593     Document Type: Conference Paper

References (3)

1. Nobutaka Kikuiri, et al, "Development of Advanced Reticle Inspection Apparatus for hp 65 nm node device and beyond", Proc. SPIE, Vol.6283, 62830Y, (2006)
2. Takehiko Nomura, et al, "Specification and performance of the newly developed mask inspection system (NPI- 5000)", Digest of Papers Photomask Japan 2007, p195 (2007)
3. Hideo Tsuchiya, Masakazu Tokita, Takehiko Nomura, and Tadao Inoue "Die-to-database mask inspection with variable sensitivity", Proc. SPIE 7028,70282I (2008).