Effects of pH variation in aqueous solutions on dissolution of copper oxide

Surface and Interface Analysis

Volumn 42, Issue 6-7, 2010, Pages 1128-1130

  Ko, Cheon Kwang ^a   Lee, Won Gyux ^a  

^a Kangwon National University   (South Korea)

Author keywords

Citric acid; Cleaning solution; Copper oxides; Monoethanolamine; Solubility

Indexed keywords

ACIDIC CONDITIONS; AQUEOUS SOLUTIONS; CITRIC ACID SOLUTION; CLEANING SOLUTION; COMPLEXING AGENTS; COPPER FILMS; COPPER IONS; COPPER SURFACE; ELECTROCHEMICAL IMPEDANCE; METALLIC COPPER; MONOETHANOLAMINE; PH VALUE; PH VARIATION; SOLVENT PROPERTIES; VARIOUS PH; X RAY PHOTOEMISSION SPECTROSCOPY;

ACIDS; CITRIC ACID; COPPER; DISSOLUTION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; EMISSION SPECTROSCOPY; METAL IONS; METALLIC COMPOUNDS; PH EFFECTS; SOLUBILITY; SOLUTIONS; SURFACE ROUGHNESS;

COPPER OXIDES;

EID: 77954286132     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.3238     Document Type: Conference Paper

References (17)

1. M. A. Martinez, Solid State Technol. 1994, 37(5), 26.
2. T. Furusawa, N. Sakuma, D. Ryuzake, S. Kondo, K. Takeda, S. Machida, R. Yoneyama, K. Hinode, J. Electrochem. Soc. 2001, 748(4), G190.
3. S. Rode, C. Henninot, C. Vallie'res, M. Matlosz, J. Electrochem. Soc. 2004, 757(6), C405.
4. Y. K. Hong, D. H. Com, S. H. Lee, T. G. Kim, J. G. Park, A. A. Busnaina, J. Electrochem. Soc. 2004, 757(11), G756.
5. S. Tamilmani, W. Huang, S. Raghavan, J. Electrochem. Soc. 2004, 757(9), G638.
6. X. Q. Wang, Y. F. Zhang, Key Eng. Mater. 1987, 20, 2799.
7. R. J. Flannery, B. Ke, M. W. Grieb, D. Trivich, J. Am. Chem. Soc. 1955, 77, 2996.
8. J. Macdougall, C. Reid, L. McGhee, Solid State Phenomena 2008, 734, 324.
9. V.R.K. Gorantla, D. Goia, E. Matijevic, S. V. Babu, J. Electrochem. Soc. 2005, 752(12), G912.
10. L. Borucki, Z. Li, A. Philipssian, J. Electrochem. Soc. 2004, 151(9), G559.
11. C. W. Shin, Y. Y. Wang, C. C. Wan, J. Appl. Electrochem. 2003, 33, 403.
12. S. Mahapatra, R. S. Suvrahmanya, Proc. Math. Sci. 1963, 58(3), 161.
13. Y. F. Wu, T.H. Tsai, Microelect. Eng. 2007, 84, 2790.
14. E. Apem, B. R. Rogersand, J. A. Sellers, J. Vac. Sci. Technol. A 1998, 76, 1227.
15. S. Poulston, P. M. Parlett, P. Stone, M. Bowker, Surf. Interface Anal. 1996, 24, 811.
16. J. Chastain, Handbook of X-ray Photoelectron Spectroscopy, Perkin-Elmer: Eden Prairie, MN, 1992.
17. J. R. Macdonald, Impedance Spectroscopy, John Wiley& Sons:New York, 1987.