Direct Resist Removal Process from Copper-Exposed Vias for Low-Parasitic-Capacitance Interconnects

Journal of the Electrochemical Society

Volumn 148, Issue 4, 2001, Pages

  Furusawa, Takeshi ^a,b   Sakuma, Noriyuki ^a   Ryuzaki, Daisuke ^a   Kondo, Seiichi ^a,b   Takeda, Ken Ichi ^a   Machida, Shuntaro ^a   Yoneyama, Ryo ^a   Hinode, Kenji ^a  

^a HITACHI LTD   (Japan)

^b ELECTROCHEMICAL SOCIETY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0346446428     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1353580     Document Type: Article

References (14)

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