High rate deposition of photocatalytic TiO2 films by dc magnetron sputtering using a TiO2-x target

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 4, 2008, Pages 903-907

  Sato, Yasushi ^a   Uebayashi, Akira ^a   Ito, Norihiro ^a   Kamiyama, Toshihisa ^b   Shigesato, Yuzo ^a  

^a AOYAMA GAKUIN UNIVERSITY   (Japan)

^b AGC Ceramics Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALDEHYDES; ARGON; MAGNETRONS; METALS; SCALE (DEPOSITS); SPUTTER DEPOSITION; TARGETS;

ACETALDEHYDE (CH3CHO); DC-MAGNETRON SPUTTERING; FLOW RATIOS; GLASS SUBSTRATES; HIGH RATE DEPOSITION; HYSTERESIS CURVES; METAL TARGETS; OXIDE MODE; PHOTO DECOMPOSITION; PHOTO-INDUCED HYDROPHILICITY; PHOTOCATALYTIC TIO2 FILMS; POSTANNEALED; TRANSITION REGION (TR);

MAGNETRON SPUTTERING;

EID: 46449088391     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2870226     Document Type: Article

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