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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 4, 2010, Pages 842-845

Spatial resistivity distribution of transparent conducting impurity-doped ZnO thin films deposited on substrates by dc magnetron sputtering

(4) Minami, Tadatsugu a Oda, Jun Ichi a Nomoto, Jun Ichi a Miyata, Toshihiro a

a KANAZAWA INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AL-DOPED ZNO; CONVENTIONAL DC MAGNETRON SPUTTERING; DC MAGNETRON SPUTTERING; DEPOSITION CONDITIONS; DOPED ZNO; GA-DOPED ZNO; KEY FACTORS; LOW OXYGEN; PRACTICAL USE; RESISTIVITY DISTRIBUTIONS; SUBSTRATE SURFACE; TRANSPARENT ELECTRODE;

CONDUCTIVE FILMS; DEPOSITION; GALLIUM; METALLIC FILMS; OPTICAL FILMS; OXYGEN; SINTERING; SUBSTRATES; TARGETS; THIN FILMS; VAPOR DEPOSITION; ZINC OXIDE;

FILM PREPARATION;

EID: 77954193682 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.3357284 Document Type: Conference Paper

Times cited : (9)

References (16)

1
- 0003759821
- (Institute of Physics, Bristol).
- H. L. Hartnagel, A. L. Dawar, A. K. Jain, and C. Jagadish, Semiconducting Transparent Thin Films (Institute of Physics, Bristol, 1995).
- (1995) Semiconducting Transparent Thin Films
- Hartnagel, H.L.¹ Dawar, A.L.² Jain, A.K.³ Jagadish, C.⁴

2
- 0034251174
- MRSBEA 0883-7694.
- T. Minami, MRS Bull. MRSBEA 0883-7694 25, 38 (2000).
- (2000) MRS Bull. , vol.25 , pp. 38
- Minami, T.¹

3
- 17044403452
- Transparent conducting oxide semiconductors for transparent electrodes
- DOI 10.1088/0268-1242/20/4/004
- T. Minami, Semicond. Sci. Technol. SSTEET 0268-1242 20, S35 (2005). 10.1088/0268-1242/20/4/004 (Pubitemid 40496724)
- (2005) Semiconductor Science and Technology , vol.20 , Issue.4
- Minami, T.¹

4
- 0021370957
- Electrical and optical properties of zinc oxide thin films prepared by rf magnetron sputtering for transparent electrode applications
- DOI 10.1063/1.333196
- H. Nanto, T. Minami, S. Shooji, and S. Takata, J. Appl. Phys. JAPIAU 0021-8979 55, 1029 (1984). 10.1063/1.333196 (Pubitemid 14526603)
- (1984) Journal of Applied Physics , vol.55 , Issue.4 , pp. 1029-1034
- Nanto, H.¹ Minami, T.² Shooji, S.³ Takata, S.⁴

5
- 0000876821
- JAPLD8 0021-4922,. 10.1143/JJAP.31.L257
- T. Minami, H. Sato, H. Imamoto, and S. Takata, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922 31, L257 (1992). 10.1143/JJAP.31.L257
- (1992) Jpn. J. Appl. Phys., Part 2 , vol.31 , pp. 257
- Minami, T.¹ Sato, H.² Imamoto, H.³ Takata, S.⁴

6
- 0022113552
- JAPNDE 0021-4922,. 10.1143/JJAP.24.944
- K. Tominaga, K. Kuroda, and O. Tada, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 24, 944 (1985). 10.1143/JJAP.24.944
- (1985) Jpn. J. Appl. Phys., Part 1 , vol.24 , pp. 944
- Tominaga, K.¹ Kuroda, K.² Tada, O.³

7
- 0024038627
- JAPNDE 0021-4922,. 10.1143/JJAP.27.1176
- K. Tominaga, K. Kuroda, and O. Tada, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 27, 1176 (1988). 10.1143/JJAP.27.1176
- (1988) Jpn. J. Appl. Phys., Part 1 , vol.27 , pp. 1176
- Tominaga, K.¹ Kuroda, K.² Tada, O.³

8
- 33845434864
- JVTAD6 0734-2101,. 10.1116/1.576890
- S. Ishibashi, Y. Higuchi, Y. Ota, and K. Nakamura, J. Vac. Sci. Technol. A JVTAD6 0734-2101 8, 1403 (1990). 10.1116/1.576890
- (1990) J. Vac. Sci. Technol. A , vol.8 , pp. 1403
- Ishibashi, S.¹ Higuchi, Y.² Ota, Y.³ Nakamura, K.⁴

9
- 33846326267
- Investigation on the electrical properties and inhomogeneous distribution of ZnO:Al thin films prepared by dc magnetron sputtering at low deposition temperature
- DOI 10.1063/1.2407265
- X. B. Zhang, Z. L. Pei, J. Fong, and C. Sun, J. Appl. Phys. JAPIAU 0021-8979 101, 014910 (2007). 10.1063/1.2407265 (Pubitemid 46120716)
- (2007) Journal of Applied Physics , vol.101 , Issue.1 , pp. 014910
- Zhang, X.B.¹ Pei, Z.L.² Gong, J.³ Sun, C.⁴

10
- 0028445418
- THSFAP 0040-6090,. 10.1016/0040-6090(94)90891-5
- K. Ichihara, N. Inoue, M. Okubo, and N. Yasuda, Thin Solid Films THSFAP 0040-6090 245, 152 (1994). 10.1016/0040-6090(94)90891-5
- (1994) Thin Solid Films , vol.245 , pp. 152
- Ichihara, K.¹ Inoue, N.² Okubo, M.³ Yasuda, N.⁴

11
- 44249118332
- THSFAP 0040-6090,. 10.1016/j.tsf.2007.10.063
- T. Minami, Thin Solid Films THSFAP 0040-6090 516, 5822 (2008). 10.1016/j.tsf.2007.10.063
- (2008) Thin Solid Films , vol.516 , pp. 5822
- Minami, T.¹

12
- 33646490764
- JAPLD8 0021-4922,. 10.1143/JJAP.45.L409
- T. Minami, T. Miyata, Y. Ohtani, and Y. Mochizuki, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922 45, L409 (2006). 10.1143/JJAP.45.L409
- (2006) Jpn. J. Appl. Phys., Part 2 , vol.45 , pp. 409
- Minami, T.¹ Miyata, T.² Ohtani, Y.³ Mochizuki, Y.⁴

13
- 65649095188
- THSFAP 0040-6090,. 10.1016/j.tsf.2009.03.022
- J. C. Lin, K. C. Peng, T. Y. Yeh, and S. L. Lee, Thin Solid Films THSFAP 0040-6090 517, 4715 (2009). 10.1016/j.tsf.2009.03.022
- (2009) Thin Solid Films , vol.517 , pp. 4715
- Lin, J.C.¹ Peng, K.C.² Yeh, T.Y.³ Lee, S.L.⁴

14
- 0033703601
- SCTEEJ 0257-8972,. 10.1016/S0257-8972(00)00566-1
- I. Safi, Surf. Coat. Technol. SCTEEJ 0257-8972 127, 203 (2000). 10.1016/S0257-8972(00)00566-1
- (2000) Surf. Coat. Technol. , vol.127 , pp. 203
- Safi, I.¹

15
- 33644751699
- K. Utsumi and A. Kondo, Transactions of MRS of Japan 20, 542 (1996).
- (1996) Transactions of MRS of Japan , vol.20 , pp. 542
- Utsumi, K.¹ Kondo, A.²

16
- 33644760339
- Characterization of indium-tin oxide sputtering targets showing various densities of nodule formation
- DOI 10.1016/j.tsf.2005.09.200, PII S0040609005018390
- T. Omata, M. Kita, H. Okada, S. Otsuka-Yao-Matsuo, N. Ono, and H. Ikawa, Thin Solid Films THSFAP 0040-6090 503, 22 (2006). 10.1016/j.tsf.2005.09.200 (Pubitemid 43343579)
- (2006) Thin Solid Films , vol.503 , Issue.1-2 , pp. 22-28
- Omata, T.¹ Kita, M.² Okada, H.³ Otsuka-Yao-Matsuo, S.⁴ Ono, N.⁵ Ikawa, H.⁶

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