Transparent and conducting ZnO(:Al) films deposited by simultaneous RF- and DC-excitation of a magnetron

Thin Solid Films

Volumn 317, Issue 1-2, 1998, Pages 413-416

  Ellmer, K ^a   Cebulla, R ^a   Wendt, R ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

DC excitation; Magnetron; RF excitation; RF sputtering

Indexed keywords

CRYSTAL STRUCTURE; DEPOSITION; ELECTRIC PROPERTIES; IONS; MAGNETRON SPUTTERING; MAGNETRONS; OPTICAL PROPERTIES; ZINC OXIDE;

DIRECT CURRENT EXCITATION; RADIO FREQUENCY EXCITATION; RADIO FREQUENCY SPUTTERING;

THIN FILMS;

EID: 0032049650     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00633-0     Document Type: Article

References (6)

1. J. Kessler, M. Ruckh, D. Hariskos, U. Rühle, R. Menner, H.W. Schock, Proc. 23rd IEEE Photovoltaic Specialists Conference, Louisville, KY, 10-14 May, 1993, IEEE, Piscataway, p. 447.
2. R. Scheer, T. Walter, H.W. Schock, M.L. Fearheiley, H.J. Lewerenz, Appl. Phys. Lett. 63 (1993) 3294.
3. M.P. Seah, Thin Solid Films 81 (1981) 279.
4. K. Ellmer, R. Wendt, R. Cebulla, Proc. 25th IEEE Photovoltaic Specialists Conf., Washington, DC, USA, May 1996.
5. G.Y. Yeom, M.J. Kushner, J. Appl. Phys. 65 (1989) 3816.
6. K. Ellmer, F. Kudella, R. Mientus, R. Schieck, S. Fiechter, Thin Solid Films 247 (1994) 15.