메뉴 건너뛰기




Volumn 57, Issue 7, 2010, Pages 1492-1496

Off-state breakdown characterization in AlGaN/GaN HEMT using drain injection technique

Author keywords

AlGaN GaN; high electron mobility transistors (HEMT); off state breakdown; source injection

Indexed keywords

ALGAN/GAN; ALGAN/GAN HEMTS; BREAKDOWN VOLTAGE; GATE LEAKAGES; I-V MEASUREMENTS; INJECTION CURRENTS; INJECTION LEVELS; INJECTION MEASUREMENT; INJECTION TECHNIQUES;

EID: 77954031314     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2010.2048960     Document Type: Article
Times cited : (66)

References (16)
  • 1
    • 0028485013 scopus 로고
    • Wide band gap compound semiconductors for superior high-voltage unipolar power devices
    • Aug.
    • T. P. Chow and R. Tyagi, "Wide band gap compound semiconductors for superior high-voltage unipolar power devices," IEEE Trans. Electron Devices, vol.41, no.8, pp. 1481-1483, Aug. 1994.
    • (1994) IEEE Trans. Electron Devices , vol.41 , Issue.8 , pp. 1481-1483
    • Chow, T.P.1    Tyagi, R.2
  • 2
    • 0347338036 scopus 로고    scopus 로고
    • High breakdown voltage AlGaN-GaN power-HEMT design and high current density switching behavior
    • Dec.
    • W. Saito, Y. Takada, M. Kuraguchi, K. Tsuda, I. Omura, T. Ogura, and H. Ohashi, "High breakdown voltage AlGaN-GaN power-HEMT design and high current density switching behavior," IEEE Trans. Electron Devices, vol.50, no.12, pp. 2528-2531, Dec. 2003.
    • (2003) IEEE Trans. Electron Devices , vol.50 , Issue.12 , pp. 2528-2531
    • Saito, W.1    Takada, Y.2    Kuraguchi, M.3    Tsuda, K.4    Omura, I.5    Ogura, T.6    Ohashi, H.7
  • 8
    • 79956026601 scopus 로고    scopus 로고
    • Gate leakage effect and breakdown voltage in metalorganic vapor phase epitaxy AlGaN/GaN heterostructure field-effect transistors
    • Apr.
    • W. S. Tan, P. A. Houston, P. J. Parbrook, D. A. Wood, G. Hill, and C. R. Whitehouse, "Gate leakage effect and breakdown voltage in metalorganic vapor phase epitaxy AlGaN/GaN heterostructure field-effect transistors," Appl. Phys. Lett., vol.80, no.17, pp. 3207-3209, Apr. 2002.
    • (2002) Appl. Phys. Lett. , vol.80 , Issue.17 , pp. 3207-3209
    • Tan, W.S.1    Houston, P.A.2    Parbrook, P.J.3    Wood, D.A.4    Hill, G.5    Whitehouse, C.R.6
  • 9
    • 2342637723 scopus 로고    scopus 로고
    • Off-state breakdown of GaAs PHEMTs: Review and new data
    • Mar.
    • R. Menozzi, "Off-state breakdown of GaAs PHEMTs: Review and new data," IEEE Trans. Electron Devices, vol.4, no.1, pp. 54-62, Mar. 2004.
    • (2004) IEEE Trans. Electron Devices , vol.4 , Issue.1 , pp. 54-62
    • Menozzi, R.1
  • 11
    • 0001323827 scopus 로고    scopus 로고
    • Temperature dependence of impact ionization in AlGaN-GaN heterostructure field effect transistors
    • DOI 10.1063/1.121418, PII S0003695198015204
    • N. Dyakonova, A. Dickens, M. S. Shur, R. Gaska, and J. W. Yang, "Temperature dependence of impact ionization in AlGaN-GaN heterostructures field effect transistors," Appl. Phys. Lett., vol.72, no.20, pp. 2562-2564, May 1998. (Pubitemid 128671576)
    • (1998) Applied Physics Letters , vol.72 , Issue.20 , pp. 2562-2564
    • Dyakonova, N.1    Dickens, A.2    Shur, M.S.3    Gaska, R.4    Yang, J.W.5
  • 13
    • 17444389230 scopus 로고    scopus 로고
    • Gate current leakage and breakdown mechanism in unpassivated AlGaN/GaN high electron mobility transistors by post-gate annealing
    • Mar.
    • H. Kim, J. N Lee, D. Liu, and W. Lu, "Gate current leakage and breakdown mechanism in unpassivated AlGaN/GaN high electron mobility transistors by post-gate annealing," Appl. Phys. Lett., vol.86, no.14, p. 143 505, Mar. 2005.
    • (2005) Appl. Phys. Lett. , vol.86 , Issue.14 , pp. 143-505
    • Kim, H.1    Lee, J.N.2    Liu, D.3    Lu, W.4
  • 14
    • 0032477129 scopus 로고    scopus 로고
    • Relationship between physical properties and gas purification in GaN grown by metalorganic vapor phase epitaxy
    • Dec.
    • M. A. di Forte-Poisson, F. Huet, A. Romann, M. Tordjman, D. Lancefield, E. Pereira, J. Di Persio, and B. Pecz, "Relationship between physical properties and gas purification in GaN grown by metalorganic vapor phase epitaxy," J. Cryst. Growth, vol.195, no.1-4, pp. 314-318, Dec. 1998.
    • (1998) J. Cryst. Growth , vol.195 , Issue.1-4 , pp. 314-318
    • Di Forte-Poisson, M.A.1    Huet, F.2    Romann, A.3    Tordjman, M.4    Lancefield, D.5    Pereira, E.6    Di Persio, J.7    Pecz, B.8
  • 15
    • 64549149263 scopus 로고    scopus 로고
    • Source injection induced off-state breakdown and its improvement by enhanced back barrier with fluorine ion implantation in AlGaN/GaN HEMTs
    • M. J.Wang and K. J. Chen, "Source injection induced off-state breakdown and its improvement by enhanced back barrier with fluorine ion implantation in AlGaN/GaN HEMTs," in IEDM Tech. Dig., 2008, pp. 149-152.
    • (2008) IEDM Tech. Dig. , pp. 149-152
    • Wang, M.J.1    Chen, K.J.2
  • 16
    • 0027649811 scopus 로고
    • A new drain-current injection technique for the measurement of off-state breakdown voltage in FETs
    • Aug.
    • S. R. Bahl and J. A. del Alamo, "A new drain-current injection technique for the measurement of off-state breakdown voltage in FETs," IEEE Trans. Electron Devices, vol.40, no.8, pp. 1558-1560, Aug. 1993.
    • (1993) IEEE Trans. Electron Devices , vol.40 , Issue.8 , pp. 1558-1560
    • Bahl, S.R.1    Del Alamo, J.A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.