Control of thin film growth in chemical vapor deposition manufacturing systems: A feasibility study

Journal of Manufacturing Science and Engineering

Volumn 124, Issue 3, 2002, Pages 715-724

  Chiu, Wilson K S ^a   Jaluria, Yogesh ^a   Glumac, Nick G ^a  

^a RUTGERS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; ATMOSPHERIC PRESSURE; AUTOMATION; CHEMICAL REACTORS; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; FILM GROWTH; OPTIMIZATION; TITANIUM NITRIDE; TURNAROUND TIME;

PARAMETER SPACE MAPPINGS;

CHEMICAL VAPOR DEPOSITION;

EID: 0036700162     PISSN: 10871357     EISSN: None     Source Type: Journal    
DOI: 10.1115/1.1465434     Document Type: Article

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