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Journal of Materials Research

Volumn 15, Issue 2, 2000, Pages 317-328

Continuous chemical vapor deposition processing with a moving finite thickness susceptor

(2) Chiu, Wilson K S a Jaluria, Yogesh a

a RUTGERS UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY CONDITIONS; CERAMIC MATERIALS; CHEMICAL VAPOR DEPOSITION; HEAT CONVECTION; MASS TRANSFER; OPTICAL COATINGS; OPTIMIZATION; REACTION KINETICS; SILICON; SURFACE REACTIONS; THERMAL DIFFUSION;

SUSCEPTORS;

THIN FILMS;

EID: 0034142467 PISSN: 08842914 EISSN: None Source Type: Journal
DOI: 10.1557/JMR.2000.0050 Document Type: Article

Times cited : (19)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.