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Volumn 37, Issue 2, 2000, Pages 113-132

Numerical simulation of chemical vapor deposition processes under variable and constant property approximations

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EID: 0001121425     PISSN: 10407782     EISSN: 15210634     Source Type: Journal    
DOI: 10.1080/104077800274334     Document Type: Article
Times cited : (20)

References (25)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.