Geometry impact on ultrahigh resolution pattern collapse

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2504-2507

  Jouve, A ^a   Simon, J ^b   Gonon, L ^b   Tortai, J H ^a  

^a CNRS   (France)

^b CEA GRENOBLE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

MATHEMATICAL MODELS; PRESSURE EFFECTS; STRENGTH OF MATERIALS;

EXPOSURE DOSE HETEROGENEITY; PATTERN COLLAPSE;

LITHOGRAPHY;

EID: 37149010502     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2801866     Document Type: Article

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