Surfactant-aided supercritical carbon dioxide drying for photoresists to prevent pattern collapse

Journal of Supercritical Fluids

Volumn 42, Issue 1, 2007, Pages 150-156

  Lee, Min Young ^a   Do, Kyung Min ^a   Ganapathy, Hullathy Subban ^a   Lo, Young Seop ^b   Kim, Ju Jin ^b   Choi, Sang Jun ^c   Lim, Kwon Taek ^a  

^a Pukyong National University   (South Korea)

^b Chonbuk National University   (South Korea)

^c SAMSUNG Electronics   (South Korea)

Author keywords

Pattern collapse; Photoresist; Supercritical carbon dioxide; Surfactant; Wafer cleaning

Indexed keywords

CARBON DIOXIDE; CHAIN LENGTH; COPOLYMERS; DRYING; HYDROCARBONS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SURFACE ACTIVE AGENTS;

FLUOROCARBON SURFACTANTS; POLYMERIC SURFACTANTS; SUPERCRITICAL CARBON DIOXIDE; WAFER CLEANING;

SUPERCRITICAL FLUIDS;

EID: 34248662085     PISSN: 08968446     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.supflu.2006.12.014     Document Type: Article

References (22)

1. Simons J.P., Goldfarb D.L., Angelopoulos M., Messick S., Moreau W.M., Robinson C., de Pablo J.J., and Nealey P. Image collapse issues in photoresist. Proceedings of SPIE 4345 (2001) 19-29
2. Jincao Y., and Matthews M.A. Prevention of photoresist pattern collapse by using liquid carbon dioxide. Ind. Eng. Chem. Res. 40 (2001) 5858-5860
3. Matthews M.A., and Beenel J. Effect of pressure on the static forces of micron-scale particle adhesion. Ind. Eng. Chem. Res. 39 (2000) 4481-4486
4. Zhang X., Pham J.Q., Ryza N., Green P.F., and Johnston K.P. Chemical-mechanical photoresist drying in supercritical carbon dioxide with hydrocarbon surfactants. J. Vac. Sci. Technol. B 22 (2004) 818-825
5. Namatsu H. Supercritical drying for water-rinsed resist systems. J. Vac. Sci. Technol. B 18 (2000) 3308-3312
6. Jones C.A., Zweber A., Deyoung J.P., Mcclain J.B., Carbonell R., and Desimone J.M. Application of "Dry" processing in the microelectronics industry using carbon dioxide. Crit. Rev. Solid State Mat. Sci. 29 (2004) 97-109
7. Namatsu H., Yamazaki K., and Kurihara K. Supercritical drying for nanostructure fabrication without pattern collapse. Microelectron. Eng. 46 (1999) 129-132
8. Namatsu H., Yamazaki K., and Kurihara K. Supercritical resist dryer. J. Vac. Sci. Technol. B 18 (2000) 780-784
9. Goldfarb D.L., de Pablo J.J., Nealey P.F., Simons J.P., Moreau W.M., and Angelopoulos M.J. Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse. J. Vac. Sci. Technol. B 18 (2000) 3313-3317
10. 2-based mixed mobile phases: a review. J. Microcol. Sep. 4 (1992) 91-122
11. 2. Influence on SFE of organics and metal chelates. Anal. Chem. 67 (1995) 4040-4043
12. Consani K.A., and Smith R.D. Observations on the solubility of surfactants and related molecules in carbon dioxide at 50 °C. J. Supercrit. Fluids 3 (1990) 51-65
13. Johnston K.P., Harrison K.L., Clarke M.J., Howdle S.M., Heitz M.P., Bright F.V., Carlier C., and Randolph T.W. Water-in-carbon dioxide microemulsions: an environment for hydrophiles including proteins. Science 271 (1996) 624-626
14. Ryoo W., Webber S.E., and Johnston K.P. Water-in-carbon dioxide microemulsions with methylated branched hydrocarbon surfactants. Ind. Eng. Chem. Res. 42 (2003) 6348-6358
15. 2-soluble hydrocarbon-based metal precursor. Ind. Eng. Chem. Res. 45 (2006) 3323-3347
16. Liu Z.T., and Erkey C. Water in carbon dioxide microemulsions with fluorinated analogues of AOT. Langmuir 17 (2001) 274-277
17. Keiper J.S., Simhan R., Desimone J.M., Wignall G.D., Melnichenko Y.B., and Frielinghaus H. New phosphate fluorosulfactants for carbon dioxide. J. Am. Chem. Soc. 124 (2002) 1834-1835
18. Hwang H.S., Kim H.J., Jeong Y.T., Gal Y.S., and Lim K.T. Synthesis and properties of semifluorinated copolymers of oligo(ethylene glycol) methacrylate and 1H,1H,2H,2H-perfluorooctyl methacrylate. Macromolecules 37 (2004) 9821-9825
19. Hwang H.S., Heo J.Y., Jeong Y.T., Jin S.H., Cho D.H., Chang T.H., and Lim K.T. Preparation and properties of semifluorinated block copolymers of 2-(dimethylamino)ethyl methacrylate and fluorooctyl methacrylates. Polymer 44 (2003) 5153-5158
20. Lim K.T., Lee M.Y., Moon M.J., Lee G.D., Hong S.S., Dickson J.L., and Johnston K.P. Synthesis and properties of semifluorinated block copolymers containing poly(ethylene oxide) and poly(fluorooctyl methacrylates) via atom transfer radical polymerization. Polymer 43 (2002) 7043-7049
21. Lee C.T., Psathas P.A., Johnston K.P., deGrazia J., and Randolph T.W. Water-in-carbon dioxide emulsions: formation and stability. Langmuir 15 (1999) 6781-6791
22. Condo P.D., Paul D.R., and Johnston K.P. Glass transitions of polymers with compressed fluid diluents - type-II and type-III behavior. Macromolecules 27 (1994) 365-371