The adsorption of cationic surfactants on photoresist surfaces and its effect on the pattern collapse in high aspect ratio patterning

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 311, Issue 1-3, 2007, Pages 83-92

  Drechsler, A ^a   Bellmann, C ^a   Synytska, A ^a   Petong, N ^a   Grundke, K ^a   Stamm, M ^a   Reichelt, J ^a,b   Wunnicke, O ^b  

^a LEIBNIZ INSTITUTE OF POLYMER RESEARCH DRESDEN   (Germany)

^b QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

Author keywords

Adsorption; Capillary forces; Cationic surfactant; Hydrocarbon chain length; Pattern collapse

Indexed keywords

ADSORPTION; CHAIN LENGTH; CONTACT ANGLE; HYDROCARBONS; PHOTOLITHOGRAPHY; PHOTORESISTORS;

CAPILLARY FORCES; HYDROCARBON CHAIN LENGTH; PATTERN COLLAPSE;

CATIONIC SURFACTANTS;

CATION; HYDROCARBON; SURFACTANT;

ADSORPTION; ARTICLE; CONTACT ANGLE; ELLIPSOMETRY; MICROELECTRODE; PHYSICAL CHEMISTRY; PRIORITY JOURNAL; ZETA POTENTIAL;

EID: 35648995904     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2007.05.069     Document Type: Article

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