Checking design conformance and optimizing manufacturability using automated double patterning decomposition

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6925, Issue , 2008, Pages

  Cork, Chris ^a   Ward, Brian ^b   Barnes, Levi ^b   Painter, Ben ^b   Lucas, Kevin ^b   Luk Pat, Gerry ^b   Wiaux, Vincent ^c   Verhaegen, Staf ^c   Maenhoudt, Mireille ^c  

^a Synopsys SARL   (France)

^b SYNOPSYS INC   (United States)

^c IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

DOUBLE PATTERNING; EXTREME UV; HIGH INDEX IMMERSION;

DECOMPOSITION; INTEGRATED CIRCUIT LAYOUT; LITHOGRAPHY; OPTICAL DESIGN;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 43249105336     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.774647     Document Type: Conference Paper

References (4)