A study of CD budget in spacer patterning technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Mukai, Hidefumi ^a   Shiobara, Eishi ^a   Takahashi, Shinya ^a   Hashimoto, Kohji ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

CD budget; CD control; Design for manufacturability (DfM); Double patterning technology (DPT); Spacer patterning technologies (SPT)

Indexed keywords

ARCHITECTURAL DESIGN; BUDGET CONTROL; CADMIUM; CADMIUM COMPOUNDS; COMPUTER NETWORKS; CRACK DETECTION; DATA STORAGE EQUIPMENT; FIBER OPTIC SENSORS; LITHOGRAPHY; MACHINE DESIGN; PROCESS DESIGN; TECHNOLOGY;

(E ,3E) PROCESS; CD BUDGET; CD VARIATIONS; DESIGN-FOR-MANUFACTURABILITY (DFM); DEVICE ENGINEERING; DEVICE TECHNOLOGIES; DOUBLE PATTERNING; END DEVICES; ERROR SOURCES; GRID PATTERNS; INDIVIDUAL (PSS 544-7); OPTICAL MICRO LITHOGRAPHY; PATTERNING PROCESSES; PATTERNING TECHNOLOGIES; PROCESS TECHNOLOGIES (CO);

PROCESS ENGINEERING;

EID: 45449100143     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.773565     Document Type: Conference Paper

References (1)

1. Woo-Yung Jung,et al., "Patterning with spacer for extending the resolution limit of current lithography tool" Proc. SPIE6156,2006