Adhesion of DNA nanostructures and DNA origami to lithographically patterned self-assembled monolayers on Si[100]

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7637, Issue , 2010, Pages

  Sarveswaran, Koshala ^a   Gao, Bo ^a   Kim, Kyoung Nan ^a   Bernstein, Gary H ^b   Lieberman, Marya ^a  

^a UNIVERSITY OF NOTRE DAME   (United States)

^b University of Notre Dame   (United States)

Author keywords

DNA; electron beam lithography; origami; self assembled monolayer; siloxane; x ray photoelectron spectroscopy

Indexed keywords

AMINOPROPYLTRIETHOXYSILANE; BINDING SELECTIVITY; DNA NANOSTRUCTURES; FLOWING WATERS; MIXED MONOLAYERS; MOLE FRACTION; SAMS; SILICON DIOXIDE; TRIMETHYL; X RAY PHOTOELECTRON SPECTRA;

CHLORINE COMPOUNDS; DNA; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON ENERGY LEVELS; ELECTRONS; GENES; MICA; NANOSTRUCTURES; ORGANIC POLYMERS; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; SILICA; SILICATE MINERALS; SURFACE CHARGE; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

SELF ASSEMBLED MONOLAYERS;

EID: 77953314230     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.848392     Document Type: Conference Paper

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