Sub-10 nm lithography with self-assembled monolayers

Applied Physics Letters

Volumn , Issue , 1995, Pages 1504-

  Lercel, M J ^a   Craighead, H G ^a   Parikh, A N ^b   Seshadri, K ^b   Allara, D L ^b  

^a Cornell University ^*  (United States)

^b PENNSYLVANIA STATE UNIVERSITY   (United States)

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EID: 36448999482     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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