Spectroscopic imaging ellipsometry for characterization of nanofilm pattern on Si substrate

Chinese Optics Letters

Volumn 8, Issue SUPPL., 2010, Pages 114-118

  Meng, Yonghong ^a,b   Chen, She ^a,b   Jin, Gang ^a  

^a INSTITUTE OF MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COLLIMATING OPTICS; IMAGING LENS; LATERAL RESOLUTION; NANO FILMS; PROBE BEAM; SI SUBSTRATES; SOLID SUBSTRATES; SPECTROSCOPIC IMAGING; THICKNESS RESOLUTION; XENON LAMPS;

ELECTRIC LAMPS; SILICON COMPOUNDS; SPIN POLARIZATION; XENON;

ELLIPSOMETRY;

EID: 77953271637     PISSN: 16717694     EISSN: None     Source Type: Journal    
DOI: 10.3788/COL201008S1.0114     Document Type: Article

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