A new spectral imaging ellipsometer for measuring the thickness of patterned thin films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 9 A, 2004, Pages 6475-6476

  Chegal, Won ^a   Cho, Yong Jai ^a   Kim, Hyun Jong ^a   Cho, Hyun Mo ^b   Lee, Yun Woo ^a   Kim, Soo Hyun ^b  

^a Korea Research Institute of Standards and Science   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Ellipsometry; Imaging ellipsometer; Spectral imaging; Thickness; Thin film

Indexed keywords

CAMERAS; CHARGE COUPLED DEVICES; ELLIPSOMETRY; ERROR ANALYSIS; HOLOGRAPHY; MATHEMATICAL MODELS; MULTILAYERS;

FRESNEL REFLECTION; IMAGING ELLIPSOMETRY; OPTICAL PARAMETERS;

THIN FILMS;

EID: 9144237198     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.6475     Document Type: Article

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