High-Q, low impedance polysilicon resonators with 10 NM air gaps

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2010, Pages 695-698

  Cheng, Tiffany J ^a   Bhave, Sunil A ^a  

^a Department of Obstetrics Gynecology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AIR-GAPS; CONSISTENT PERFORMANCE; DUAL LAYER; FABRICATION PROCESS; IN-VACUUM; LOW IMPEDANCE; MOTIONAL IMPEDANCE; MULTIPLE DEVICES; POLYSILICON RESONATORS; PORT MEASUREMENTS; QUALITY FACTORS; RF MEMS RESONATORS;

MECHANICAL ENGINEERING; MECHANICS; MICROELECTROMECHANICAL DEVICES; POLYSILICON; REACTIVE ION ETCHING; RESONATORS; SILICON COMPOUNDS; TEMPERATURE CONTROL;

FABRICATION;

EID: 77952770795     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MEMSYS.2010.5442311     Document Type: Conference Paper

References (8)

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