Oscillator far-from-carrier phase noise reduction via nano-scale gap tuning of micromechanical resonators

TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems

Volumn , Issue , 2009, Pages 798-801

  Akgul, Mehmet ^a   Kim, Bongsang ^a   Hung, Li Wen ^a   Lin, Yang ^a   Li, Wei Chang ^a   Huang, Wen Lung ^a   Gurin, Ilya ^a   Borna, Ashkan ^a   Nguyen, Clark T C ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Atomic layer deposition; Capacitive transducer; MEMS resonator; Oscillator phase noise

Indexed keywords

CAPACITIVE GAPS; CAPACITIVE TRANSDUCERS; CARRIER PHASE; ELECTRODE GAP; ELECTRONIC APPLICATION; FREQUENCY REFERENCE; MEMS RESONATOR; MEMS RESONATORS; MICROMECHANICAL DISK RESONATORS; MICROMECHANICAL RESONATOR; NANO SCALE; NOISE REDUCTIONS; POWER HANDLING; SHORT TERM STABILITY; STAND -ALONE;

ACTUATORS; ATOMIC LAYER DEPOSITION; ATOMS; DISKS (STRUCTURAL COMPONENTS); HAFNIUM COMPOUNDS; MEMS; MICROELECTROMECHANICAL DEVICES; MICROSYSTEMS; NANOSENSORS; NANOSTRUCTURED MATERIALS; OSCILLATORS (ELECTRONIC); PHASE NOISE; PIEZOELECTRIC TRANSDUCERS; RESONATORS; TUNING;

SOLID-STATE SENSORS;

EID: 71449111292     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SENSOR.2009.5285683     Document Type: Conference Paper

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