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Volumn , Issue , 2010, Pages 580-583

Evaluation of the piezoresistive and electrical properties of polycrystalline silicon-germanium for MEMS sensor applications

Author keywords

[No Author keywords available]

Indexed keywords

BORON-DOPED; ELECTRICAL PROPERTY; FINITE ELEMENT SIMULATIONS; GAUGE FACTORS; MEMS SENSORS; PIEZO-RESISTIVE; PIEZORESISTIVE PROPERTIES; PIEZORESISTIVE SENSORS; POLY-CRYSTALLINE SILICON; POLY-SIGE; TEMPERATURE COEFFICIENT OF RESISTANCE;

EID: 77952768882     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MEMSYS.2010.5442437     Document Type: Conference Paper
Times cited : (8)

References (14)
  • 1
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  • 2
    • 0035249549 scopus 로고    scopus 로고
    • Experimetal Determination of the maximum post-processing temperature of MEMS on top of standard CMOS wafers
    • S Sedky et al, "Experimetal Determination of the maximum post-processing temperature of MEMS on top of standard CMOS wafers", IEEE Trans. Electron Devices, Vol.48 (2), pp. 1-9, 2001.
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    • Sedky, S.1
  • 4
    • 0028482908 scopus 로고
    • Deposition and properties of low-pressure chemical vapor deposited polycrystalline silicon-germanium films
    • T.J. King et al, "Deposition and properties of low-pressure chemical vapor deposited polycrystalline silicon-germanium films", Journal of The Electrochem. Society, 141, 2235-2241 (1994).
    • (1994) Journal of the Electrochem. Society , vol.141 , pp. 2235-2241
    • King, T.J.1
  • 5
    • 84954134782 scopus 로고    scopus 로고
    • A low temperature (≤550°C) silicon germanium MOS thin-film transistor technology for large area electronics
    • T.J. King et al, "A low temperature (≤550°C) silicon germanium MOS thin-film transistor technology for large area electronics", IEDM '91 technical digest 567-570.
    • IEDM '91 Technical Digest , pp. 567-570
    • King, T.J.1
  • 6
    • 76449086545 scopus 로고    scopus 로고
    • Evaluation of Piezoresistivity and 1/f Noise of Polycrystalline SiGe for MEMS sensors applications
    • P. Gonzalez et al, "Evaluation of Piezoresistivity and 1/f Noise of Polycrystalline SiGe for MEMS sensors applications", Proceedings Eurosensors '08
    • Proceedings Eurosensors '08
    • Gonzalez, P.1
  • 7
    • 77951117607 scopus 로고    scopus 로고
    • Evaluation of the electrical properties, piezoresistivity and noise of poly-SiGe for MEMS-above-CMOS applications
    • P. Gonzalez et al, "Evaluation of the electrical properties, piezoresistivity and noise of poly-SiGe for MEMS-above-CMOS applications", Mater. Res. Soc. Symp. A Proc., Vol. 1153 (2009)
    • (2009) Mater. Res. Soc. Symp. A Proc. , vol.1153
    • Gonzalez, P.1
  • 9
    • 0036924688 scopus 로고    scopus 로고
    • Electrical properties and noise of poly SiGe deposited at temperatures compatible with MEMS integration on top of standard CMOS
    • S. Sedky et al, "Electrical properties and noise of poly SiGe deposited at temperatures compatible with MEMS integration on top of standard CMOS", Mat. Res. Soc. Symp. Proc. Vol 729 (2002)
    • (2002) Mat. Res. Soc. Symp. Proc. , vol.729
    • Sedky, S.1
  • 10
    • 0033293532 scopus 로고    scopus 로고
    • Micromachined polycrystalline thin film temperature sensors
    • L. Jiang et al, "Micromachined polycrystalline thin film temperature sensors", Meas. Sci. Technol., Vol. 10, pp. 653-664 (1999).
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    • Jiang, L.1
  • 12
    • 50149085107 scopus 로고    scopus 로고
    • Determination of the piezoresistivity of microcrystalline Silicon-Germanium and application to a pressure sensor
    • S. Lenci et al, "Determination of the piezoresistivity of microcrystalline Silicon-Germanium and application to a pressure sensor", Proc. MEMS '08, 427-430
    • Proc. MEMS '08 , pp. 427-430
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  • 13
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    • Post-CMOS integration of germanium microstructures
    • A. Franke et al, "Post-CMOS integration of germanium microstructures", Proc. MEMS '99
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  • 14
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    • Practical model for electrical properties of highly doped p-type polysilicon
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.