A low-temperature ( (2) King, Tsu Jae a Saraswat, Krishna C a a STANFORD UNIVERSITY (United States)

Technical Digest - International Electron Devices Meeting, IEDM

Volumn 1991-January, Issue , 1991, Pages 567-570

Author keywords

[No Author keywords available]

Indexed keywords

BICMOS TECHNOLOGY; ELECTRON DEVICES; FIELD EFFECT TRANSISTORS; GERMANIUM; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING ORGANIC COMPOUNDS; SEMICONDUCTING SILICON; SILICON ALLOYS; TEMPERATURE; THIN FILMS;

ANNEAL TEMPERATURES; CHEMICAL VAPOR DEPOSITED; FABRICATION PROCESS; LARGE-AREA ELECTRONICS; POLY-SI TFT TECHNOLOGY; POLYCRYSTALLINE SILICON GERMANIUMS; PROCESS TEMPERATURE; THIN-FILM TRANSISTOR (TFTS);

THIN FILM TRANSISTORS;

EID: 84954134782     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IEDM.1991.235406     Document Type: Conference Paper

References (0)