Gas adsorption properties of fluorocarbon thin films prepared using three different types of RF magnetron sputtering systems

Japanese Journal of Applied Physics

Volumn 49, Issue 4 PART 2, 2010, Pages

  Iwamori, Satoru ^a   Hasegawa, Norihiko ^a   Yano, Satoshi ^a   Noda, Kazutoshi ^b  

^a KANAZAWA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

[CARBONYL; ADSORPTION PROPERTIES; AROMATIC GROUP; CHEMICAL STRUCTURE; FLUOROCARBON THIN FILMS; HIGH SENSITIVITY; HYDROXYL GROUPS; LOW SENSITIVITY; METHYL SALICYLATE; NON-POLAR SOLVENTS; POLAR MOIETIES; POLAR SOLVENTS; QUARTZ CRYSTAL; RF-MAGNETRON SPUTTERING;

ACETONE; ALDEHYDES; ETHANOL; GAS ADSORPTION; MAGNETIC FIELDS; MAGNETRON SPUTTERING; OXIDE MINERALS; POLYTETRAFLUOROETHYLENES; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; SURFACE PROPERTIES; TOLUENE;

THIN FILMS;

EID: 77952693535     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.04DK17     Document Type: Article

References (23)

1. M. Rost, H. J. Erler, H. Giegengack, O. Fiedler, and Ch. Weissmantel: Thin Solid Films 20 (1974) S15.
2. H. W. Lehmann, K. Frick, R. Widmer, J. L. Vossen, and E. James: Thin Solid Films 52 (1978) 231.
3. H. Biederman: Vacuum 31 (1981) 285.
4. Y. Yamada and T. Kurobe: Jpn. J. Appl. Phys. 32 (1993) 5090.
5. J. L. He, W. Z. Li, L. D. Wang, J. Wang, and H. D. Li: Nucl. Instrum. Methods Phys. Res., Sect. B 135 (1998) 512.
6. H. Biederman: Vacuum 59 (2000) 594.
7. H. Biederman, M. Zeuner, J. Zalman, P. Bílková, D. Slavínská, V. Stelmasuk, and A. Boldyreva: Thin Solid Films 392 (2001) 208.
8. Y. Nagayama, S. Iwamori, and Y. Yamada: Shinku 46 (2003) 827 [in Japanese].
9. V. Stelmashuk, H. Biederman, D. Slavínská, J. Zemek, and M. Trchová: Vacuum 77 (2005) 131.
10. D. S. Bodas, A. B. Mandale, and S. A. Gangal: Appl. Surf. Sci. 245 (2005) 202.
11. S. Iwamori, K. Kezuka, and A. Uemura: Zairyo 57 (2008) 611 [in Japanese].
12. S. Iwamori, N. Hasegawa, A. Uemura, T. Tanabe, and I. Nishiyama: Vacuum 84 (2009) 592.
13. S. Iwamori, N. Hasegawa, and A. Uemura: Surf. Coat. Technol. 203 (2008) 59.
14. H. Terryn, J. Vereecken, and N. de Jaeger: Colloids Surf. A 80 (1993) 171.
15. M. Hashiba, T. Hino, Y. Hirohata, H. Shinbori, S. Deyama, and H. Chiyoda: Thin Solid Films 332 (1998) 141.
16. K. Noda, R. Naganawa, Y. Kanekiyo, and H. Tao: Chem. Lett. 32 (2003) 1128.
17. K. Noda, K. Matsunobu, H. Aizawa, S. Kurosawa, R. Naganawa, and H. Tao: Denki Gakkai Ronbunshi E 125 (2005) 50 [in Japanese].
18. T. Tanabe, S. Yanao, S. Iwamori, and K. Noda: Ext. Abstr. VASSCAA-4, 2008, p. 410.
19. S. Iwamori, Y. Yamada, Y. Ono, and K. Ikeda: in Adhesion Aspects of Thin Films, ed. K. L. Mittal (VSP, Utrecht, 2007) Vol.3, p. 21.
20. K. Noda, R. Naganawa, Y. Kanekiyo, and H. Tao: Chem. Lett. 32 (2003) 1128.
21. A. Uemura, S. Yano, S. Iwamori, and K. Noda: Zairyo no Kagaku to Kogaku 45 (2008) 143 [in Japanese].
22. Y. Kitazaki and T. Hata: Nihon Secchaku Gakkaishi 8 (1972) 131 [in Japanese].
23. G. Sauerbrey: Z. Phys. 155 (1959) 206 [in German