Adsorption properties of thin films prepared by RF sputtering with a poly(biphenyltetracarboxylic dianhydride-paraphenylene diamine) polyimide target

Japanese Journal of Applied Physics

Volumn 49, Issue 4 PART 2, 2010, Pages

  Iwamori, Satoru ^a   Yano, Satoshi ^a   Sugimoto, Ryousuke ^a   Uemura, Akihiro ^a,b   Matsumoto, Hiroyuki ^a,c   Noda, Kazutoshi ^d  

^a KANAZAWA UNIVERSITY   (Japan)

^b INDUSTRIAL RESEARCH INSTITUTE OF ISHIKAWA   (Japan)

^c Iwasaki Electric Co Ltd   (Japan)

^d NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORBED GAS; ADSORPTION PROPERTIES; CHEMICAL STRUCTURE; GAS MOLECULES; METHYL SALICYLATE; MOLECULAR SIZE; PARA-PHENYLENES; QUARTZ CRYSTAL; RF-SPUTTERING; SPUTTERED THIN FILMS; SURFACE FREE ENERGY; TOP SURFACE;

ACETONE; ALDEHYDES; ETHANOL; GAS ADSORPTION; MOLECULES; OXIDE MINERALS; POLYIMIDES; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; SURFACE PROPERTIES; THIN FILMS; TOLUENE;

VAPOR DEPOSITION;

EID: 77952693534     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.04DK18     Document Type: Article

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