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Japanese Journal of Applied Physics

Volumn 48, Issue 8 Part 2, 2009, Pages

Effect of annealing with ar plasma irradiation for transparent conductive Nb-doped TiO2 films on glass substrate

(2) Hojo, Mika a Okimura, Kunio a

a TOKAI UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AR PLASMAS; DOPED-TIO; GLASS SUBSTRATES; HIGH DENSITY PLASMAS; NB ATOMS; NB FILM; OPTICAL TRANSMITTANCE; OXYGEN DEFECT; POST ANNEALING; TIO; TRANSPARENT CONDUCTIVE; TRANSPARENT CONDUCTIVE OXIDES; VISIBLE WAVELENGTHS;

ANNEALING; CONDUCTIVE FILMS; GLASS; IRRADIATION; NIOBIUM OXIDE; OXIDE FILMS; OXYGEN; PLASMA DENSITY; PLASMAS; SUBSTRATES;

AMORPHOUS FILMS;

EID: 77952686783 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.48.08HK06 Document Type: Article

Times cited : (8)

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