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Japanese Journal of Applied Physics, Part 2: Letters

Volumn 43, Issue 5 B, 2004, Pages

Epitaxial growth of rutile TiO2 films on MgO substrate in inductively coupled plasma-assisted sputtering

(2) Okimura, Kunio a Furumi, Takahiro a

a TOKAI UNIVERSITY (Japan)

Author keywords

Epitaxial growth; Inductively coupled plasma assisted sputtering; MgO substrate; Rutile Tio2

Indexed keywords

ANNEALING; CRYSTALLINE MATERIALS; EPITAXIAL GROWTH; FILM GROWTH; INDUCTIVELY COUPLED PLASMA; MAGNESIA; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

INDUCTIVELY COUPLED PLASMA ASSISTED SPUTTERING; MGO SUBSTRATE; RUTILE TIO2; TURBOMOLECULAR PUMPS (TMP);

TITANIUM DIOXIDE;

EID: 3142680319 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.43.l655 Document Type: Article

Times cited : (9)

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